Vladar, András E.: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 21 August 2011)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V - Strategies for nanoscale contour metrology using critical dimension atomic force microscopy

Orji, Ndubuisi G., Postek, Michael T., Dixson, Ronald G., Vládar, András E., Postek, Michael T.

Year:

2011

Language:

english

File:

PDF, 755 KB

english, 2011

2

Image sharpness measurement in scanning electron microscopy—part I

M. L. T. Chae Postek, András E. Vladár

Journal:

Year:

1998

Language:

english

File:

PDF, 699 KB

english, 1998

3

Contour metrology using critical dimension atomic force microscopy

Orji, Ndubuisi G., Dixson, Ronald G., Ng, Boon Ping, Vladár, András E., Postek, Michael T.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 3.31 MB

english, 2016

4

Image sharpness measurement in the scanning electron microscope—Part III

Nien Fan Zhang, Michael T. Postek, Robert D. Larrabee, András E. Vladár, William J. Keery, Samuel N. Jones

Journal:

Year:

1999

Language:

english

File:

PDF, 1.02 MB

english, 1999

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Reference material (RM) 8820: a versatile new NIST standard for nanometrology

Postek, Michael T., Raymond, Christopher J., Vladar, Andras E., Keery, William, Bishop, Michael, Bunday, Benjamin, Allgair, John

Year:

2010

Language:

english

File:

PDF, 3.58 MB

english, 2010

6

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California (Sunday 1 August 2010)] Instrumentation, Metrology, and Standards for Nanomanufacturing IV - Multipurpose instrument calibration standard for particle beam, scanned probe and optical microscopy: NIST reference material (RM) 8820

Postek, Michael T., Postek, Michael T., Vladar, András E., Keery, William, Bishop, Michael, Bunday, Benjamin, Allgair, John

Year:

2010

Language:

english

File:

PDF, 3.58 MB

english, 2010

7

Effects of wafer noise on the detection of 20-nm defects using optical volumetric inspection

Barnes, Bryan M., Goasmat, Francois, Sohn, Martin Y., Zhou, Hui, Vladár, András E., Silver, Richard M.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 5.15 MB

english, 2015

8

Modeling for accurate dimensional scanning electron microscope metrology: then and now

Michael T. Postek, András E. Vladár

Journal:

Year:

2011

Language:

english

File:

PDF, 490 KB

english, 2011

9

SPIE Proceedings [SPIE SPIE Nanoscience + Engineering - San Diego, California, United States (Sunday 9 August 2015)] Nanoengineering: Fabrication, Properties, Optics, and Devices XII - Nanomanufacturing concerns about measurements made in the SEM part IV: charging and its mitigation

Campo, Eva M., Dobisz, Elizabeth A., Eldada, Louay A., Postek, Michael T., Vladár, András E.

Year:

2015

Language:

english

File:

PDF, 403 KB

english, 2015

10

[ACM Press the 2016 - Denver, Colorado, USA (2016.07.20-2016.07.24)] Proceedings of the 2016 on Genetic and Evolutionary Computation Conference Companion - GECCO '16 Companion - An Attractor Network-Based Model with Darwinian Dynamics

de Vladar, Harold P., Fedor, Anna, Szilágyi, András, Zachar, István, Szathmáry, Eörs

Year:

2016

Language:

english

File:

PDF, 2.31 MB

english, 2016

11

Cognitive Architecture with Evolutionary Dynamics Solves Insight Problem

Fedor, Anna, Zachar, István, Szilágyi, András, Öllinger, Michael, de Vladar, Harold P., Szathmáry, Eörs

Journal:

Frontiers in Psychology

Year:

2017

Language:

english

File:

PDF, 1.98 MB

english, 2017

12

Image sharpness measurement in scanning electron microscopy—part II

Andrá E. Vladár, Michael T. Postek, Mark. P. Davidson

Journal:

Year:

1998

Language:

english

File:

PDF, 1.21 MB

english, 1998

13

Oliver C. Wells' Vision: Use of Low-Loss Electrons to Enhance and Measure the Surface Detail in the Scanning Electron Microscope at High Resolution

Postek, Michael T., Vladar, Andras E., Ming, Bin

Journal:

Microscopy and Microanalysis

Year:

2014

Language:

english

File:

PDF, 1.11 MB

english, 2014

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Optical volumetric inspection of sub-20nm patterned defects with wafer noise

Cain, Jason P., Sanchez, Martha I., Barnes, Bryan M., Goasmat, Francois, Sohn, Martin Y., Zhou, Hui, Vladár, András E., Silver, Richard M., Arceo, Abraham

Year:

2014

Language:

english

File:

PDF, 4.37 MB

english, 2014

15

SPIE Proceedings [SPIE NanoScience + Engineering - San Diego, CA (Sunday 10 August 2008)] Instrumentation, Metrology, and Standards for Nanomanufacturing II - Cellulose nanocrystals the next big nano-thing?

Postek, Michael T., Vladar, Andras, Dagata, John, Farkas, Natalia, Ming, Bin, Sabo, Ronald, Wegner, Theodore H., Beecher, James, Postek, Michael T., Allgair, John A.

Year:

2008

Language:

english

File:

PDF, 4.88 MB

english, 2008

16

Digital imaging for scanning electron microscopy

Michael T. Postek, András E. Vladár

Journal:

Year:

1996

Language:

english

File:

PDF, 1.61 MB

english, 1996

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - 10nm three-dimensional CD-SEM metrology

Cain, Jason P., Sanchez, Martha I., Vladár, András E., Villarrubia, John S., Chawla, Jasmeet, Ming, Bin, Kline, Joseph R., List, Scott, Postek, Michael T.

Year:

2014

Language:

english

File:

PDF, 2.23 MB

english, 2014

18

Application of the low-loss scanning electron microscope image to integrated circuit technology. Part 1– applications to accurate dimension measurements

Michael T. Postek, András E. Vladár, Oliver C. Wells, Jerry L. Lowney

Journal:

Year:

2001

Language:

english

File:

PDF, 281 KB

english, 2001

19

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Determination of optimal parameters for CD-SEM measurement of line-edge roughness

Bunday, Benjamin D., Bishop, Michael, McCormack, Jr., Donald W., Villarrubia, John S., Vladar, Andras E., Dixson, Ronald, Vorburger, Theodore V., Orji, N. G., Allgair, John A., Silver, Richard M.

Year:

2004

Language:

english

File:

PDF, 509 KB

english, 2004

20

Calibrating image roughness by estimating Lipschitz exponents, with applications to image restoration

Vladár, András E.

Journal:

Optical Engineering

Year:

2008

Language:

english

File:

PDF, 1.49 MB

english, 2008

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Proximity-associated errors in contour metrology

Villarrubia, John S., Raymond, Christopher J., Dixson, Ronald G., Vladár, András E.

Year:

2010

Language:

english

File:

PDF, 1.30 MB

english, 2010

22

Inexpensive digital imaging?

Michael T. Postek, Andras E. Vladar

Journal:

Year:

1997

Language:

english

File:

PDF, 842 KB

english, 1997

23

Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regression

Henn, Mark-Alexander, Silver, Richard M., Villarrubia, John S., Zhang, Nien Fan, Zhou, Hui, Barnes, Bryan M., Ming, Bin, Vladár, András E.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 4.64 MB

english, 2015

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Contour metrology using critical dimension atomic force microscopy

Orji, Ndubuisi G., Dixson, Ronald G., Vladár, András E., Ming, Bin, Postek, Michael T., Starikov, Alexander

Year:

2012

Language:

english

File:

PDF, 1.32 MB

english, 2012

25

Application of the low-loss scanning electron microscope image to integrated circuit technology. Part II— chemically-mechanically planarized samples

Oliver C. Wells, Maurice McGlashan-Powell, András E. Vladár, Michael T. Postek

Journal:

Year:

2001

Language:

english

File:

PDF, 1.49 MB

english, 2001

26

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Simulation study of repeatability and bias in the CD-SEM

Villarrubia, John S., Vladar, Andras E., Postek, Michael T., Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 930 KB

english, 2003

27

Development of the metrology and imaging of cellulose nanocrystals

Postek, Michael T, Vladár, András, Dagata, John, Farkas, Natalia, Ming, Bin, Wagner, Ryan, Raman, Arvind, Moon, Robert J, Sabo, Ronald, Wegner, Theodore H, Beecher, James

Journal:

Measurement Science and Technology

Year:

2011

Language:

english

File:

PDF, 2.57 MB

english, 2011

28

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - New method for the measurement of SEM stage vibrations

Damazo, Bradley N., Jayewardene, Eranga C., Vladar, Andras E., Keery, William J., Postek, Michael T., Silver, Richard M.

Year:

2004

Language:

english

File:

PDF, 1.09 MB

english, 2004

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - TSOM method for semiconductor metrology

Attota, Ravikiran, Dixson, Ronald G., Kramar, John A., Potzick, James E., Vladár, András E., Bunday, Benjamin, Novak, Erik, Rudack, Andrew, Raymond, Christopher J.

Year:

2011

Language:

english

File:

PDF, 3.17 MB

english, 2011

30

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Is a production-level scanning electron microscope linewidth standard possible?

Postek, Jr., Michael T., Vladar, Andras E., Villarrubia, John S., Sullivan, Neal T.

Year:

2000

Language:

english

File:

PDF, 1.05 MB

english, 2000

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Accurate and traceable dimensional metrology with a reference CD-SEM

Vladár, András E., Allgair, John A., Raymond, Christopher J., Villarrubia, John S., Cizmar, Petr, Oral, Martin, Postek, Michael T.

Year:

2008

Language:

english

File:

PDF, 1.99 MB

english, 2008

32

Modification of a commercial SEM with a computer controlled cathode stabilized power supply

Michael T. Postek, William J. Keery, Andras E. Vladar

Journal:

Year:

1993

Language:

english

File:

PDF, 273 KB

english, 1993

33

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Potentials for high pressure/environmental SEM microscopy for photomask dimensional metrology

Postek, Michael T., Vladar, Andras E., Rice, Trisha M., Knowles, Ralph, Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 602 KB

english, 2003

34

Two-dimensional simulation and modeling in scanning electron microscope imaging and metrology research

Michael T. Postek, András E. Vladár, Jeremiah R. Lowney, William J. Keery

Journal:

Year:

2002

Language:

english

File:

PDF, 501 KB

english, 2002

35

Nanostructure Fabrication by Ultra-High-Resolution Environmental Scanning Electron Microscopy

Toth, Milos, Lobo, Charlene J., Knowles, W. Ralph, Phillips, Matthew R., Postek, Michael T., Vladár, András E.

Journal:

Year:

2007

Language:

english

File:

PDF, 476 KB

english, 2007

36

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Inverse scattering approach to SEM linewidth measurements

Davidson, Mark P., Vladar, Andras E., Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 1.12 MB

english, 1999

37

[AIP CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2007 International Conference on Frontiers of Characterization and Metrology - Gaithersburg, MD (27-29 March 2007)] AIP Conference Proceedings - Helium Ion Microscopy: a New Technique for Semiconductor Metrology and Nanotechnology

Postek, Michael T., Vladar, Andras E., Kramar, John, Stern, Lewis A., Notte, John, McVey, Sean, Seiler, David G., Diebold, Alain C., McDonald, Robert, Garner, C. Michael, Herr, Dan, Khosla, Rajinder P

Year:

2007

Language:

english

File:

PDF, 3.63 MB

english, 2007

38

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - SEM sentinel-SEM performance measurement system

Damazo, Bradley N., Vladar, Andras E., Ling, Alice V., Donmez, M. Alkan, Postek, Jr., Michael T., Jayewardene, E. C., Sullivan, Neal T.

Year:

2001

Language:

english

File:

PDF, 202 KB

english, 2001

39

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Challenges in Process Integration and Device Technology - Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography

Deleporte, Alain G., Allgair, John A., Archie, Charles N., Banke, Jr., G. W., Postek, Jr., Michael T., Schlesinger, Jerry E., Vladar, Andras E., Yanof, Arnold W., Burnett, David, Kimura, Shin'ichiro,

Year:

2000

Language:

english

File:

PDF, 781 KB

english, 2000

40

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Reference Material 8091: new scanning electron microscope sharpness standard

Vladar, Andras E., Postek, Jr., Michael T., Zhang, Nien-Fan, Larrabee, Robert D., Jones, Samuel N., Hajdaj, Russell E., Sullivan, Neal T.

Year:

2001

Language:

english

File:

PDF, 1.15 MB

english, 2001

41

A Tumor-Targeted Nanodelivery System to Improve Early MRI Detection of Cancer

Pirollo, Kathleen F., Dagata, John, Wang, Paul, Freedman, Matthew, Vladar, Andras, Fricke, Stanley, Ileva, Lilia, Zhou, Qi, Chang, Esther H.

Journal:

Molecular Imaging

Year:

2006

File:

PDF, 1.63 MB

2006

42

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Linewidth measurement intercomparison on a BESOI sample

Villarrubia, John S., Vladar, Andras E., Lowney, Jeremiah R., Postek, Jr., Michael T., Allen, Richard A., Cresswell, Michael W., Ghoshtagore, Rathindra N., Sullivan, Neal T.

Year:

2000

Language:

english

File:

PDF, 2.08 MB

english, 2000

43

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Potentials of online scanning electron microscope performance analysis using NIST reference material 8091

Postek, Jr., Michael T., Vladar, Andras E., Zhang, Nien-Fan, Larrabee, Robert D., Sullivan, Neal T.

Year:

2000

Language:

english

File:

PDF, 2.02 MB

english, 2000

44

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Influence of focus variation on linewidth measurements

Tanaka, Maki, Silver, Richard M., Villarrubia, John S., Vladar, Andras E.

Year:

2005

Language:

english

File:

PDF, 577 KB

english, 2005

45

SPIE Proceedings [SPIE SPIE Nanoscience + Engineering - San Diego, California, United States (Sunday 28 August 2016)] Nanoengineering: Fabrication, Properties, Optics, and Devices XIII - Nanomanufacturing concerns about measurements made in the SEM Part V: dealing with noise

Campo, Eva M., Dobisz, Elizabeth A., Eldada, Louay A., Postek, Michael T., Vladár, András E.

Year:

2016

Language:

english

File:

PDF, 2.91 MB

english, 2016

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Nanoparticle size and shape evaluation using the TSOM method

Damazo, Bradley, Attota, Ravikiran, Kavuri, Purushotham, Vladár, András E., Starikov, Alexander

Year:

2012

Language:

english

File:

PDF, 575 KB

english, 2012

47

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - CD-SEM measurement line-edge roughness test patterns for 193-nm lithography

Bunday, Benjamin D., Bishop, Michael, Villarrubia, John S., Vladar, Andras E., Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 733 KB

english, 2003

48

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Design and development of a measurement and control system for measuring SEM magnification calibration samples

Damazo, Bradley N., Jayewardene, E. C., Keery, William J., Vladar, Andras E., Postek, Jr., Michael T., Herr, Daniel J. C.

Year:

2002

Language:

english

File:

PDF, 1.26 MB

english, 2002

49

SPIE Proceedings [SPIE Advanced Microelectronic Manufacturing - Santa Clara, CA (Sunday 23 February 2003)] Process and Materials Characterization and Diagnostics in IC Manufacturing - CD-SEM measurement line edge roughness test patterns for 193 nm lithography

Bunday, Benjamin D., Bishop, Michael, Villarrubia, John S., Vladar, Andras E., Tobin, Jr., Kenneth W., Emami, Iraj

Year:

2003

Language:

english

File:

PDF, 734 KB

english, 2003

50

Design of an on-chip microscale nanoassembly system

Gorman, Jason J., Kim, Yong Sik, Vladar, Andras E., Dagalakis, Nicholas G.

Journal:

International Journal of Nanomanufacturing

Year:

2007

Language:

english

File:

PDF, 654 KB

english, 2007

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